|
|
|
|
| LEADER |
01659nam a2200325 i 4500 |
| 001 |
694a7740-1936-4060-9b71-1a2b136a5a39 |
| 005 |
20240926000000.0 |
| 008 |
800917s1979 xx a b 000 0 eng d |
| 035 |
|
|
|a (CStRLIN)CSUG18469310-B
|
| 035 |
|
|
|a (OCoLC-I)272077828
|
| 035 |
|
|
|a (OCoLC-M)38605204
|
| 035 |
|
|
|a (Sirsi) ADZ1288
|
| 040 |
|
|
|a CSt
|c CSt
|d OrLoB
|
| 100 |
1 |
|
|a Schwarz, S. A
|
| 245 |
1 |
4 |
|a The Auger sputter profiling technique and its application to studies of the Si-SiO₂ interface /
|c by Steven Allan Schwarz
|
| 260 |
|
|
|c 1979
|
| 300 |
|
|
|a xii, 166 p. :
|b graphs
|
| 500 |
|
|
|a Submitted to the Department of Electrical Engineering
|
| 502 |
|
|
|g Thesis
|b Ph.D
|c Stanford University
|d 1980.
|
| 504 |
|
|
|a Includes bibliographical references
|
| 650 |
|
0 |
|a Auger effect
|
| 650 |
|
0 |
|a Cathode sputtering (Plating process)
|
| 650 |
|
0 |
|a Semiconductor doping
|
| 650 |
|
0 |
|a Silica
|
| 650 |
|
0 |
|a Silicon
|x Surfaces
|
| 710 |
2 |
|
|a Stanford University
|b Department of Electrical Engineering.
|
| 999 |
1 |
0 |
|i 694a7740-1936-4060-9b71-1a2b136a5a39
|l a809917
|s US-CST
|m auger_sputter_profiling_technique_and_its_application_to_studies_of_th_____1979____________a________________________________________schwarz__s__a______________________p
|
| 999 |
1 |
1 |
|l a809917
|s ISIL:US-CST
|t BKS
|b 4b18f45b-fdf8-5e2e-99cd-8ad688377d77
|y 4b18f45b-fdf8-5e2e-99cd-8ad688377d77
|p UNLOANABLE
|
| 999 |
1 |
1 |
|l a809917
|s ISIL:US-CST
|t BKS
|a SPEC-SAL3-U-ARCHIVES
|b 36105118498133
|c 3781 1980 S
|d Shelving control number
|k 1
|x book
|y 36105118498133
|p UNLOANABLE
|
| 999 |
1 |
1 |
|l a809917
|s ISIL:US-CST
|t BKS
|a SAL3-STACKS
|b 36105002698988
|c 3781 1980 S
|d Shelving control number
|k 1
|x book
|y 36105002698988
|p UNLOANABLE
|