The Auger sputter profiling technique and its application to studies of the Si-SiO₂ interface /

The Auger sputter profiling technique and its application to studies of the Si-SiO₂ interface /

Bibliographic Details
Main Author: Schwarz, S. A
Corporate Author: Stanford University Department of Electrical Engineering
Format: Thesis Book
Language:English
Published: 1979
Subjects:
Auger effect
Cathode sputtering (Plating process)
Semiconductor doping
Silica
Silicon > Surfaces

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Stanford University

Holdings details from Stanford University
Call Number: 3781 1980 S
ISIL:US-CST

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