Dopant segregation at the Si/SiO₂ interface, studied with Auger sputter profiling /
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Corporate Author: | |
Format: | Thesis Book |
Language: | English |
Published: |
1981
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Internet
This item is not available through BorrowDirect. Please contact your institution’s interlibrary loan office for further assistance.Stanford University
Call Number: |
3781 1982 B ISIL:US-CST |
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